发明名称 Solid state colour imaging device and method of manufacturing the same.
摘要 On the surface of a protecting layer mounted on a solid state imaging device substrate, transparent gap filler layers and a transparent flattening layer are formed to flatten a surface of overlying protecting layer. On a surface of the transparent flattening layer, color filters of red, blue and yellow are formed. The color filters are made of synthetic photosensitive material. By using the synthetic photosensitive material, the color filters are formed with good shape and precision. All of the color filter show good photo spectrography and uniform characteristics. For the reasons, excellent characteristics of the solid state imaging device are provided which are free form image inferiority caused by flicker, shading, dust and so forth. <IMAGE>
申请公布号 EP0593197(A1) 申请公布日期 1994.04.20
申请号 EP19930307933 申请日期 1993.10.06
申请人 MATSUSHITA ELECTRONICS CORPORATION 发明人 SHIMOMURA, KOJI;SANO, YOSHIKAZU
分类号 G02B5/20;G03F7/11;G03F7/20;H01L27/14;H01L27/146;H01L31/0216;H01L31/0232;H04N5/335;H04N5/351;H04N5/365;H04N5/372;H04N9/07 主分类号 G02B5/20
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