发明名称 METHOD OF PHOTOLITHOGRAPHICALLY METALLIZING AT LEAST THE INSIDE OF HOLES ARRANGED IN ACCORDANCE WITH A PATTERN IN A PLATE OF AN ELECTRICALLY INSULATING MATERIAL
摘要 <p>A description is given of a method of metallizing an electrically insulating plate (1), for example, of glass having a large number of holes (3). Said holes are internally provided with a metal layer (21) and the plate is provided with metal tracks (23). The metal used is mainly aluminium. The aluminium is coated with a thin protective layer of chromium, cobalt, nickel, zirconium or titanium. Said protective layer makes it possible to use a photosensitive, cataphoretic lacquer for providing the metal layer with a structure. The method can very suitable be used for the manufacture of selection plates for thin electron displays.</p>
申请公布号 WO1995027924(A1) 申请公布日期 1995.10.19
申请号 IB1995000231 申请日期 1995.04.04
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