APPARATUS FOR LIGHT-BEAM TREATMENT

摘要

The apparatus for light-beam treatment comprises a radiation concentrator having a reflecting surface which is formed by a first surface of revolution, which is a truncated surface of revolution of a first ellipsoid of revolution, by a second surface which is a truncated surface of revolution of a second ellipsoid of revolution, the concentrator further having an additional reflecting truncated spherical surface located between said first and said second surfaces of revolution. A first and a second focuses of the first ellipsoid of revolution are coincident with a first and a second focuses of the second ellipsoid of revolution. The first focus is an emitting one and a gas-discharge light source is positioned therein, and the second focus is a working focus in which a workpiece being treated is placed.