| 摘要 |
PURPOSE: To prevent the occurrence of defects in a semiconductor thin film by avoiding the bringing of impurities in the thin film through a tray. CONSTITUTION: In a semiconductor thin film manufacturing device which is constituted so that semiconductor thin films can be formed in reaction chambers 2, 3, and 4 while a tray 7 carrying the substrates 6 is successively carried to a taking-out chamber 5 from a preparation chamber 1 through the reaction chambers 2, 3, and 4, a tray carrying chamber 9 is provided to carry the tray 7 discharged from the chamber 5 to the preparation chamber 1 in a state where the tray 1 is shielded from the atmosphere. |
