| 发明名称 |
SUSCEPTOR, VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD AND EPITAXIAL SILICON WAFER |
| 摘要 |
A disc-shaped susceptor includes a plurality of recesses that are aligned in a circumferential direction on an upper surface of the susceptor and in which wafers are respectively mounted, in which the susceptor is formed so that a center of the susceptor is concave toward a lower surface thereof from an outer edge thereof. |
| 申请公布号 |
US2016300753(A1) |
申请公布日期 |
2016.10.13 |
| 申请号 |
US201615088440 |
申请日期 |
2016.04.01 |
| 申请人 |
SUMCO CORPORATION |
发明人 |
HIEDA Daisuke;UCHINO Hisashi;KUSUMOTO Tatsuo |
| 分类号 |
H01L21/687;H01L29/16;C23C16/458;H01L21/02 |
主分类号 |
H01L21/687 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A disc-shaped susceptor that is provided in a vapor deposition apparatus and on which wafers are mounted, the susceptor comprising:
a plurality of recesses that are aligned in a circumferential direction on an upper surface of the susceptor and in which the wafers are respectively mounted, wherein the susceptor is formed so that a center of the susceptor is concave toward a lower surface thereof from an outer edge thereof. |
| 地址 |
Tokyo JP |
