发明名称 A FLASH EEPROM HAVING TRIPPLE STACKED CONTROL GATES
摘要 a source(3) and a drain(4) formed on a semiconductor substrate(7) and having a channel between them; a floating gate(2) formed on a part of the source(3) and the channel and insulated with an insulation film; a control gate(1) which is formed along an upper insulation film and a side insulation film in order not to be overlapped with the drain(4), being insulated with an insulation film; and a select gate(6) which is formed along the upper insulation film and the side insulation film of the control gate(1) and is insulated by having a part formed perpendicularly to the side insulation film and overlapped with the drain(4) region.
申请公布号 KR970008451(B1) 申请公布日期 1997.05.24
申请号 KR19930030870 申请日期 1993.12.29
申请人 HYUNDAI ELECTRONICS IND. CO. 发明人 PARK, SUNG-BIN;CHOE, JONG-WOON;BAEK, DONG-WON
分类号 H01L27/115;(IPC1-7):H01L27/115 主分类号 H01L27/115
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