Deposition Methods For Uniform And Conformal Hybrid Titanium Oxide Films

摘要

Methods for depositing titanium oxide films by atomic layer deposition are disclosed. Titanium oxide films may include a titanium nitride cap, an oxygen rich titanium nitride cap or a mixed oxide nitride layer. Also described are methods for self-aligned double patterning including titanium oxide spacer films.

主权项

1. A method of forming a TiO film, the method comprising:
sequentially exposing a substrate surface to a first titanium-containing precursor and an oxygen-containing reactant to form an initial TiO film with a thickness in the range of about 80% to about 99% of a predetermined thickness of the TiO film; and sequentially exposing the initial TiO film to a second titanium-containing precursor and a nitrogen-containing reactant to form a TiN capped TiO film with the predetermined thickness.