发明名称 VALVE MECHANISM
摘要 <p>PROBLEM TO BE SOLVED: To close a chamber surely with a simple structure certainly in a slight etcher system. SOLUTION: A hot plate 43 is arranged on a bottom surface of a chamber 42 surrounded by a side wall 41a and a ceiling 41b. A transferring inlet 44 and a transferring outlet 45 are formed on the side wall 41a. Transferring units 50, 60 are operated for transferring a wafer 48. Valves 51, 61 are attached to the transferring units 50, 60 for closing the transferring inlet and outlet 44, 45 and closing the chamber 42. The valves 51, 61 are separated from the side wall 41a in the state that they are not closed, for facilitating cleaning. A structure is thus simplified because the valves 51, 61 are moved together with the transferring units 50, 60 for closure.</p>
申请公布号 JPH10227364(A) 申请公布日期 1998.08.25
申请号 JP19970033405 申请日期 1997.02.18
申请人 MIYAZAKI OKI ELECTRIC CO LTD;OKI ELECTRIC IND CO LTD 发明人 YOSHINO KATSUHIRO
分类号 F16K1/30;H01L21/205;H01L21/302;H01L21/3065;H01L21/673;H01L21/68;(IPC1-7):F16K1/30;H01L21/306 主分类号 F16K1/30
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