发明名称 PELLICLE FOR LITHOGRAPHY
摘要 <p>PROBLEM TO BE SOLVED: To surely and easily detect foreign matter on the inner face of a pellicle frame by specifying the surface roughness of the inner face of the pellicle frame and coating the inner face with an adhesive resin. SOLUTION: A pellicle film 2 is stretched on the top face of a pellicle frame 1 by way of an adhesive layer and the inner face of the pellicle frame 1 is coated with an adhesive. A sticky layer 3 is formed on the bottom of the pellicle frame 1 and a peelable releasing layer 4 is stuck on the bottom. At this time, the surface roughness of the inner face of the pellicle frame 1 is regulated to 0.3-0.9μm Ra, 4.0-8.57μm Rt and 0.3-1.1μm RMS. The material of the pellicle film 2 is not particularly limited and nitrocellulose, cellulose acetate, cellulose propionate or a non-crystalline fluorine-contg. polymer may be used. The material of the adhesive layer is, e.g. an acrylic resin adhesive, an epoxy resin adhesive, a silicone resin adhesive or a fluorine-contg. polymer such as a fluorine- contg. silicone adhesive.</p>
申请公布号 JPH11167198(A) 申请公布日期 1999.06.22
申请号 JP19970332564 申请日期 1997.12.03
申请人 SHIN ETSU CHEM CO LTD 发明人 NAGATA AKIHIKO
分类号 G03F1/64;H01L21/027;(IPC1-7):G03F1/14 主分类号 G03F1/64
代理机构 代理人
主权项
地址