| 摘要 |
PROBLEM TO BE SOLVED: To prevent a process liquid splashed from a substrate from re-sticking to the substrate by providing a rebound suppressor inside a process vessel for suppressing rebound of the process liquid splashed from the substrate. SOLUTION: With mesh-like rebound suppressors 54, 55, and 56 provided in triplet inside an outside vessel 51, a process liquid, or a liquid comprising a developer liquid, is suppressed from re-sticking to an LCD substrate G after rebound. The process liquid splashing from the rotating LCD substrate G reduces significantly in splash amount due to the rebound suppressors 54, 55, and 56 while its momentum significantly weakened, to reach the internal peripheral surface of the outside vessel 51. Thus, the amount of process liquid rebounding on the internal peripheral surface of the outside vessel 51 is less, with its momentum weakened. Even if the process liquid reaching the internal peripheral surface of the outside vessel 51 rebounds on the internal peripheral surface, it re-collides with the suppressors 56, 55, and 54 in this order for reduced amount and weakened momentum. |
