| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a substrate so that a pellicle film can be easily peeled without leaving a peeling trace on the film or without causing for on the film when the pellicle film is peeled from a substrate and that the substrate can be repeatedly used without cleaning, by treating the surface of the substrate with a specified silazane. SOLUTION: The surface of the substrate for the formation of a pellicle film is treated with a silazane expressed by the formula. In the formula, n is an integer of 0 to 5, each of R1 to R8 is independently an alkyl group. As for the method to treat the substrate surface with the silazane, for example, spin coating, vapor deposition, dipping, spray coating, or coating by a roll coater can be used, and a spin coating method and vapor deposition method are especially preferable. The vapor deposition method means that vapor of the silazane is deposited and reacted on the substrate. The method for depositing the silazane on the substrate surface may be performed under normal pressure or reduced pressure. The silazane and the substrate are housed in a chamber and the silazane vapor is deposited and reacted on the substrate.</p> |
