| 摘要 |
PROBLEM TO BE SOLVED: To obtain a uniform film thickness of a coating liquid on the whole surface even in a rectangular or non-circular substrate and to form a stable film without infiltrating the coating liquid to the rear side of the substrate. SOLUTION: This rotary coating device is provided with a turn table 3 holding and rotating the non-circular substrate 2, a coating liquid supply means for supplying the coating liquid on the surface of the substrate 2 held by the turn table 3 and a substrate holding means 4 for holding the substrate 2 so as to make the height of the surface of the substrate 2 equal to the height of the surface and to surround the substrate 2 to form an upper surface together with the substrate 2 circular and then the coating liquid supplied on the surface of the substrate 2 is uniformalized. |
