Silicon based substrate with environmental/thermal barrier layer,申请号EP20000108256-传众专利搜索

发明名称	Silicon based substrate with environmental/thermal barrier layer
摘要	<p>A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a barium-strontium alumino silicate.</p>
申请公布号	EP1044943(A1)	申请公布日期	2000.10.18
申请号	EP20000108256	申请日期	2000.04.14
申请人	UNITED TECHNOLOGIES CORPORATION;GENERAL ELECTRIC COMPANY;THE UNITED STATES OF AMERICA, REPRESENTED BY THE ADMINISTRATOR OF THE NATIONAL AERONAUTICS AND SPACE ADMINISTRATION (NASA)	发明人	EATON, HARRY E.;ALLEN, WILLIAM P.;JACOBSON, NATHAN S.;BANSAL, NARROTTAM P.;OPILA, ELIZABETH J.;SMIALEK, JAMES L.;LEE, KANG N.;WANG, HONGYU;MESCHTER, PETER J.;SPITSBERG, IRENE T.;LUTHRA, KRISHAN L.
分类号	B05D5/00;B05D7/24;B32B15/04;B32B18/00;C04B41/50;C04B41/52;C04B41/85;C04B41/87;C04B41/89;C23C4/02;C23C4/10;C23C4/18;C23C28/00;C23C28/04;(IPC1-7):C04B41/50;C23C4/04	主分类号	B05D5/00
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