发明名称 NEW FILM DEPOSITING METHOD USING PHOTOCATALYST, PROCESS FOR MANUFACTURING COLOR FILTER USING THE METHOD, ELECTROLYTE USED THEREFOR AND MANUFACTURING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a film depositing method by which a film is formed by a simple process, a process for conveniently manufacturing a high-resolution color filter having a high numerical aperture by using the film depositing method with good controllability at a low cost, an electrodeposition solution therefor, a simple film depositing device without need for an electrodeposition device or a separate electrodeposition electrode and a color filter manufacturing device. SOLUTION: A film forming substrate provided with a light-transmissive conductive thin film and a photocatalyst thin film in contact with the thin film on a light-transmissive substrate and with the conductive thin film capable of being electrically connected to an electrolyte is arranged with the photocatalyst thin film in contact with the electrolyte in the electrolyte containing a material with the solubility and dispersibility in an aqueous liquid decreased with a change in pH. The conductive thin film is electrically connected to the electrolyte, and the photocatalyst thin film is irradiated with UV to form a film on the surface of the photocatalyst thin film.</p>
申请公布号 JP2001140096(A) 申请公布日期 2001.05.22
申请号 JP19990322507 申请日期 1999.11.12
申请人 FUJI XEROX CO LTD 发明人 OTSU SHIGEMI;TOMONO TAKAO;SHIMIZU TAKASHI;AKUTSU HIDEKAZU
分类号 C23C18/14;C25D13/00;C25D13/20;G02B5/20;(IPC1-7):C25D13/00 主分类号 C23C18/14
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