发明名称 METHOD AND DEVICE FOR DOPING MELT
摘要 PROBLEM TO BE SOLVED: To provide a method for doping in which a vessel can be reused and by which doping is carried out with reduced cost and scattering of a melt is prevented at the time of doping when an easily volatile dopant such as antimony or arsenic is added into molten silicon in a Czocralski method. SOLUTION: A melt 3 is charged into a crucible 4 and a dopant 8 is charged into a vessel 1. Then, the vessel 1 is dipped into the melt 3 and thereby the dopant 8 enters the melt 3 through an opening part 5 formed in the vessel 1. In the case, the vessel has the opening part 5 which is closed by a closing member 6 which is made of the same material as that of the melt 3 and melts when it is brought into contact with the melt 3.
申请公布号 JP2001253791(A) 申请公布日期 2001.09.18
申请号 JP20010037436 申请日期 2001.02.14
申请人 WACKER SILTRONIC G FUER HALBLEITERMATERIALIEN AG 发明人 WEBER MARTIN DR;GMEILBAUER ERICH;VORBUCHNER ROBERT;NEUMAIER WALTER;VILZMANN PETER
分类号 C30B15/04;C30B29/06;(IPC1-7):C30B15/04 主分类号 C30B15/04
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