| 摘要 |
The present invention provides an electron beam processing device capable of preventing the adhesion of contaminants to an exposed irradiation part of an electron beam tube, particularly a window thereof, in a processing chamber, and also capable of controlling the rise in temperature of this irradiation unit, and in this electron beam processing device, the irradiation part of the electron beam tube (1) is disposed in the processing chamber (2) and irradiates an electron beam onto a substance (6) disposed in the processing chamber (2), the irradiation part is constituted by a lid part with an opening (31) for allowing the electron beam to pass therethrough and a window (4) which covers the opening (31) and has a transmission part (41) permeable to the electron beam, and a cooling block (7) is arranged in contact with a part of the irradiation part excluding the transmission part (41).
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