| 摘要 |
PROBLEM TO BE SOLVED: To obtain a composition for filling apertures which can provide a substantially and locally flat, aperture surface, and is more excellent in efficiency for filling a gap and etching resistance than a known composition. SOLUTION: This composition comprises one or more crosslinkable polymers each having a weight-average molecular weight of about 8,000 or less and an Mw/Mn value of at least 1.5, one or more acid catalysts, one or more crosslinking agents, and one or more solvents, wherein the crosslinkable polymers contain each a monomer having at least one hydroxyl group as a polymerization unit, the hydroxyl group being of at least about 3 wt.% relatively to the crosslinkable polymers. |
