发明名称 |
METHOD FOR RECOVERING INDIUM |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for efficiently recovering indium from high purity indium oxide-containing scrap generated at the time of producing an ITO sputtering target or after its use. SOLUTION: This method for recovering indium includes a stage in which ITO indium-containing scrap is dissolved with hydrochloric acid to form an indium chloride solution, a stage in which a sodium hydroxide aqueous solution is added to the indium chloride solution to remove tin contained in the scrap as tin hydroxide and a stage in which indium is substituted with zinc and recovered from the remaining solution freed of the tin hydroxide.</p> |
申请公布号 |
JP2002069544(A) |
申请公布日期 |
2002.03.08 |
申请号 |
JP20000256759 |
申请日期 |
2000.08.28 |
申请人 |
NIKKO MATERIALS CO LTD |
发明人 |
TAKEMOTO KOICHI;YAMAGUCHI SHUNICHIRO |
分类号 |
C01G19/00;C22B3/04;C22B3/44;C22B3/46;C22B7/00;C22B25/00;C22B58/00;C25C1/22;C25C7/06;(IPC1-7):C22B58/00 |
主分类号 |
C01G19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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