发明名称 |
Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing |
摘要 |
A chemical mechanical polishing stopper film comprising at least one organic polymer, said film having a dielectric constant of 4 or lower, and a chemical mechanical polishing method. The chemical mechanical polishing method comprises forming a chemical mechanical polishing stopper film comprising at least one organic polymer on an insulating film so that the stopper film is interposed between the insulating film and a metal film to be removed by chemical mechanical polishing, and then removing the metal film with a chemical mechanical polishing slurry.
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申请公布号 |
US2002064953(A1) |
申请公布日期 |
2002.05.30 |
申请号 |
US20010938589 |
申请日期 |
2001.08.27 |
申请人 |
JSR CORPORATION |
发明人 |
NISHIKAWA MICHINORI;OKADA TAKASHI;YAMADA KINJI |
分类号 |
H01L21/304;B24B37/04;C08L71/00;C09D171/00;H01L21/321;H01L21/768;(IPC1-7):H01L21/302;H01L21/461 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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