发明名称 PARTICLE FOR CLEANSING SUBSTRATE AND CLEANSER CONTAINING THE PARTICLE FOR CLEANSING SUBSTRATE, METHOD FOR CLEANSING SUBSTRATE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide particles which are used for cleansing substrates and can efficiently cleanse the surfaces of the substrates without damaging the substrates, to provide a cleanser containing the particles for cleansing the substrates, and to provide a method for cleansing the substrates. <P>SOLUTION: The particles for cleansing substrates are characterized by comprising an inorganic oxide and having an average particle diameter of 2 to 100μm. The inorganic oxide comprises an inorganic oxide such as silica, alumina, zirconia, titania or ceria, or a compound inorganic oxide such as silica-alumina, or silica-zirconia. The surfaces of the particles are treated with a hydrolysable organic compound represented by formula (1): R<SB>n</SB>SiX<SB>4-n</SB>(1) [R groups are each identically or differently a 1 to 10C non-substituted or substituted hydrocarbon group; X is a 1 to 4C alkoxy, silanol, a halogen, or H; (n) is 1 to 3]. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2003321700(A) 申请公布日期 2003.11.14
申请号 JP20020129043 申请日期 2002.04.30
申请人 CATALYSTS & CHEM IND CO LTD 发明人 KUMAZAWA MITSUAKI;HIRAI TOSHIHARU;SASAKI MASAKI;KOMATSU MICHIO
分类号 G02F1/13;B08B7/04;C11D7/20;C11D17/00;G02F1/1333;(IPC1-7):C11D17/00;G02F1/133 主分类号 G02F1/13
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