发明名称 ACTIVE ENERGY RAY-SENSITIVE RESIN COMPOSITION, ACTIVE ENERGY RAY-SENSITIVE RESIN FILM AND PATTERN FORMING METHOD USING SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide an active energy ray-sensitive resin composition developable with neutral water. <P>SOLUTION: A water-insoluble or slightly water-soluble acid generator which generates an acid by the action of an active energy ray is dispersed in the form of fine powder in an aqueous solution of a water-soluble resin to prepare a dispersion and an acid reactive insolubilizing agent which insolubilizes the water-soluble resin by the action of an acid is dissolved or dispersed in the dispersion. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004037955(A) 申请公布日期 2004.02.05
申请号 JP20020196577 申请日期 2002.07.04
申请人 ICHIMURA KUNIHIRO;MURAKAMI:KK 发明人 ICHIMURA KUNIHIRO;MORITA TOMOYUKI;KAWANOBU JUNICHI;ADACHI DAISAKU;INOUE KAZUO
分类号 C08F8/30;G03F7/004;G03F7/038;G03F7/12 主分类号 C08F8/30
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