发明名称 |
ACTIVE ENERGY RAY-SENSITIVE RESIN COMPOSITION, ACTIVE ENERGY RAY-SENSITIVE RESIN FILM AND PATTERN FORMING METHOD USING SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an active energy ray-sensitive resin composition developable with neutral water. <P>SOLUTION: A water-insoluble or slightly water-soluble acid generator which generates an acid by the action of an active energy ray is dispersed in the form of fine powder in an aqueous solution of a water-soluble resin to prepare a dispersion and an acid reactive insolubilizing agent which insolubilizes the water-soluble resin by the action of an acid is dissolved or dispersed in the dispersion. <P>COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004037955(A) |
申请公布日期 |
2004.02.05 |
申请号 |
JP20020196577 |
申请日期 |
2002.07.04 |
申请人 |
ICHIMURA KUNIHIRO;MURAKAMI:KK |
发明人 |
ICHIMURA KUNIHIRO;MORITA TOMOYUKI;KAWANOBU JUNICHI;ADACHI DAISAKU;INOUE KAZUO |
分类号 |
C08F8/30;G03F7/004;G03F7/038;G03F7/12 |
主分类号 |
C08F8/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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