发明名称 APPLICATION OF ELECTRON-BEAM INDUCED PLASMA PROBES TO INSPECTION, TEST, DEBUG AND SURFACE MODIFICATIONS
摘要 An electron-beam induced plasmas is utilized to establish a non-mechanical, electrical contact to a device of interest. This plasma source may be referred to as atmospheric plasma source and may be configured to provide a plasma column of very fine diameter and controllable characteristics. The plasma column traverses the atmospheric space between the plasma source into the atmosphere and the device of interest and acts as an electrical path to the device of interest in such a way that a characteristic electrical signal can be collected from the device. Additionally, by controlling the gases flowing into the plasma column the probe may be used for surface modification, etching and deposition.
申请公布号 US2016299103(A1) 申请公布日期 2016.10.13
申请号 US201415026953 申请日期 2014.10.02
申请人 PHOTON DYNAMICS INC. 发明人 Saleh Nedal;Toet Daniel;Sterling Enrique;Loewinger Ronen;Krishnaswami Sriram;Glazer Arie
分类号 G01N27/70;H01J37/32 主分类号 G01N27/70
代理机构 代理人
主权项 1. An atmospheric plasma apparatus, comprising: a vacuum enclosure having an orifice at a first side thereof; an electron source positioned inside the vacuum enclosure and having an electron extraction opening; an extractor positioned at the vicinity of the extraction opening and configured to extract electrons from the electron source so as to form an electron beam and direct the electron beam through the orifice, wherein the electron bean is configured to have a diameter smaller than diameter of the orifice; a cover configured to allow the electron beam to exit the vacuum enclosure; a pick-up electrode; means for applying a voltage potential across the plasma probe so as to drive an electron current from the sample to the pick-up electrode; and, wherein the electron beam is configured to ionize the atmosphere as it exits the vacuum enclosure so as to sustain a spatially confined plasma column or plasma probe.
地址 San Jose CA US