发明名称 Non-volatile memory device to protect floating gate from charge loss and method for fabricating the same
摘要 Disclosed are a non-volatile memory device to protect a floating gate from charge loss and a method for forming the same. At least a pair of floating gate lines are formed on a semiconductor substrate. A portion of the substrate between the floating gate lines is etched to form a trench therein. A gap-fill dielectric layer is formed in the trench and also in the gap between the pair of floating gate lines. The gap-fill dielectric layer is implanted with impurities so that positive mobile ions that may permeate the floating gate through the gap-fill dielectric layer can be trapped in the gap-fill dielectric layer.
申请公布号 US2004087086(A1) 申请公布日期 2004.05.06
申请号 US20030692590 申请日期 2003.10.23
申请人 LEE WOOK-HYOUNG 发明人 LEE WOOK-HYOUNG
分类号 H01L21/76;H01L21/265;H01L21/322;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/823;H01L21/336;H01L21/320 主分类号 H01L21/76
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