发明名称
摘要 The specification describes a process and apparatus for monitoring and controlling the ellipticity of preform tubes during Modified Chemical Vapor Deposition. In response to computer generated signals from the monitoring device, the tube collapse rate is adjusted dynamically by locally changing the temperature of the glass tube, or by changing the physical force acting to collapse the tube. <IMAGE>
申请公布号 JP3527089(B2) 申请公布日期 2004.05.17
申请号 JP19980038653 申请日期 1998.02.20
申请人 发明人
分类号 G02B6/00;C03B37/012;C03B37/018;(IPC1-7):C03B37/012 主分类号 G02B6/00
代理机构 代理人
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