| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in transparency at ≤193 nm wavelength, solubility contrast and resolution and suitable for a chemical amplifying resist. <P>SOLUTION: The radiation-sensitive resin composition comprises: (A) an acid dissociating group-containing resin which becomes alkali-soluble by the effect of an acid; (B) a radiation-sensitive acid generating agent; and (C) a compound expressed by formula (1) or formula (2) and/or a polymer having a repeating unit expressed by formula (3) or formula (4). In formulae (1), (2), (3) and (4), X represent a hydrogen atom, a trifluoromethyl group, a group expressed by formula (i), or the like. In formulae (1) and (2), at least one X represents a group of formula (i), and each of p and q represents 0 to 2. In formula (i), Rf<SB>1</SB>represents a hydrogen atom, a methyl group or a trifluoromethyl group, Y represents a single bond, a methylene group, a cyclohexylene group or a phenylene group, Z represents a hydrogen atom or an acid dissociating organic group, z represents 0 to 3, and r represents 0 to 1. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
