| 摘要 |
According to one embodiment of the present invention, a chamber device may be provided with: a chamber (2); a target generation device, which is assembled to the chamber and supplies a target material to a predetermined region in the chamber, said target generation device being provided with a tank unit (260) for storing the target material, a temperature variable device (141) that changes the temperature of the target material in the tank unit, and a nozzle unit (262) including a nozzle hole for outputting the liquid-state target material; a gas nozzle (303) that is disposed such that a gas introducing port faces the nozzle unit; a gas supply source (301) that supplies a hydrogen-containing gas to the gas nozzle such that the hydrogen-containing gas is supplied to at least the periphery of the nozzle unit; and a water removing device that removes water at least at the periphery of the nozzle unit in the chamber. |
