| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device and method for a surface treatment capable of improving a surface treatment rate by promoting an additional reaction of the surface after a surface of a processed body is treated in a plasma discharge area. <P>SOLUTION: This device for surface treatment is provided with a second dielectric member 42 having a gas passage 60 between a first dielectric member 41, and a third dielectric member 43 wherein a discharging gap is formed between an applying side electrode part 20 and an earth side electrode part 30, and for processing the surface 71 by exposing the surface 71 of the processed body 70 to excitation active species of the gas plasma discharged between the applying side electrode part 20 and the earth side electrode parts 30 under atmospheric pressure or a pressure near the atmospheric pressure and provided through a gas passage 60 plasma. The third dielectric member 43 is extended from the applying side electrode part 20 to a downstream side of a moving direction of the earth side electrode part 30 apart from the earth side electrode part 30. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
