| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition suitable when an exposure light source at ≤160 nm, in particular F<SB>2</SB>excimer laser light (at 157 nm), is used, and specifically, to provide a positive resist composition showing sufficient transmitting property when a light source at 157 nm is used, and having excellent coating property, resolution, exposure latitude and dissolution contrast. <P>SOLUTION: The positive resist composition contains: (A) a resin which has a structure having a repeating unit expressed by formula (a) and the solubility of which with an alkali developing solution is increased by the effect of an acid; and (B) an acid generating agent which generates an acid by irradiation with active rays or radiation. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
