APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE HAVING A GAS MIXER

摘要

An apparatus for manufacturing semiconductor devices having a gas mixer includes a gas supply and a reaction chamber, and the gas supply includes an upper gas mixer, an intermediate gas mixer disposed under the upper gas mixer, a lower gas mixer disposed under the intermediate gas mixer, a first gas supply pipe which is disposed on an upper portion of the upper gas mixer and supplies a first gas to the upper gas mixer, a second gas supply pipe which is disposed on an upper end portion of a side surface of the upper gas mixer and supplies a second gas to the upper gas mixer, and a third gas supply pipe which is disposed on a side surface of the intermediate gas mixer and supplies a third gas to the intermediate gas mixer.

主权项

1. An apparatus for manufacturing a semiconductor device, comprising:
a gas supply; and a reaction chamber, wherein the gas supply comprises: an upper gas mixer; an intermediate gas mixer positioned under the upper gas mixer; a lower gas mixer positioned under the intermediate gas mixer; a first gas supply pipe positioned on an upper portion of the upper gas mixer and configured to supply a first gas to the upper gas mixer; a second gas supply pipe positioned on an upper end portion of a side surface of the upper gas mixer and configured to supply a second gas to the upper gas mixer; and a third gas supply pipe positioned on a side surface of the intermediate gas mixer and configured to supply a third gas to the intermediate gas mixer.