发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To realize a semiconductor device with high reliability capable of mounting in a low damage, and of forming a metal terminal having uniform height and smoothness at low cost. <P>SOLUTION: The rise in temperature of an insulating layer 6 generated by the frictional heat in cutting a workpiece by using a cutting tool is suppressed below temperature 80&deg;C. After flattening processing, while maintaining a prescribed temperature range of temperature lower than 80&deg;C through the whole cutting work process, an electrode 5 and an electrode 19 are correspondingly brought to contact at temperature lower than the hardening temperature of the insulating layer 6 above 80&deg;C. The insulating resin is hardened above its hardening temperature, after liquefying the insulating layer 6 and filling up with the insulating resin of the insulating layer 6 between the electrode 5 and the electrode 19. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005294430(A) 申请公布日期 2005.10.20
申请号 JP20040105529 申请日期 2004.03.31
申请人 FUJITSU LTD 发明人 MIZUKOSHI MASATAKA;IMAIZUMI NOBUHIRO;SAKAI TAIJI
分类号 H01L21/60;H01L21/44;H01L21/48;H01L21/56;H01L23/31;H01L23/485 主分类号 H01L21/60
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