| 摘要 |
1432305 Photographic material for photomasks AGFA-GEVAERT AG 8 Feb 1974 [8 Feb 1973] 05858/74 Heading G2C Photographic material for producing masks comprises in order (a) a transparent support, (b) a metal, metal oxide or Si layer (c) a photoresist layer e.g. a photopolymerizable or polyizer/ azide layer, (d) a silver halide layer the layer (c) or a layer between (c) and (d), containing a dye which has an absorption maximum at a wavelength to which the silver halide is sensitive but does not absorb in a region to which the photoresist is sensitive. Specified photo-resists are cyclized polyizoprene/azide, polymers containing sulphonyl azide groups (e.g. Specification 1062884), polyvinyl cinnamates, photocross linkable polymers as Specifications 1384343 and 1373146 and photopolymerizable compositions as Specification 741441. Preferably an adhesion promoting layer of a hydrolysable organosilane is applied to the photo-resist layer (c) before application of layer (d). The specified screening dyes are of Formula. with an absorption maximum of 546 nm. The specified silver halide emulsion is a green sensitized silver bromoiodide emulsion with an average grain diameter of 0À05 millimicrons.
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