MULTILAYER REFLECTION COATING-FITTED SUBSTRATE, REFLECTION TYPE MASK BLANK, REFLECTION TYPE MASK AND PRODUCTION METHODS THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a multilayer reflection coating-fitted substrate capable of forming a high precision standard mark at a low cost.SOLUTION: Provided is a method for producing a multilayer refection coating-fitted substrate in which multilayer reflection coatings reflecting EUV light are formed on a substrate. The process includes a step where standard marks serving as the standards of the detective position in detective information are formed. The standard mark is composed of a main mark 13a for deciding the standard point of the detective information and an auxiliary mari 13b arranged around the main mark, and the main mark 13a and the auxiliary mark 13b are formed by different methods.SELECTED DRAWING: Figure 6