发明名称 Photopolymerizable composition.
摘要 <p>A photopolymerizable composition comprising an addition-polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator, characterized in that the initiator comprises (a) a compound of the formula: &lt;Chemistry id="chema01" num="0001"&gt;&lt;Image id="ia01" he="25" wi="85" file="IMGA0001.TIF" imgContent="chem" imgFormat="TIFF" inline="no" /&gt;&lt;/Chemistry&gt;wherein R&lt;Sup&gt;1&lt;/Sup&gt; and R&lt;Sup&gt;2&lt;/Sup&gt; are alkyl group, n is 1, 2 or 3 and ring A is an aromatic ring containing nitrogen atom, and (b) hexaarylbiimidazole. The initiator may additionally contain a thiol of the formula: &lt;Chemistry id="chema02" num="0002"&gt;&lt;Image id="ia02" he="17" wi="94" file="IMGA0002.TIF" imgContent="chem" imgFormat="TIFF" inline="no" /&gt;&lt;/Chemistry&gt;wherein Z is -0-, -S- or -NH-. The composition is not only highly sensitive to ultraviolet ray but also highly stable in storage.</p>
申请公布号 EP0138187(A2) 申请公布日期 1985.04.24
申请号 EP19840112103 申请日期 1984.10.09
申请人 MITSUBISHI CHEMICAL INDUSTRIES LIMITED 发明人 NAGASAKA, HIDEKI
分类号 C08F2/00;C08F2/50;G03F7/004;G03F7/031;(IPC1-7):C08F2/50;G03C1/68 主分类号 C08F2/00
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