发明名称 |
Reactor and susceptor for chemical vapor deposition process. |
摘要 |
<p>A reactor for use in a chemical vapor deposition process occurring in a radiant absorption heater system employs a vertical gas flow reaction vessel and a novel substantially solid susceptor configured as a truncated wedge. The susceptor is characterized by a high utilized area, resulting in a high wafer capacity and low power requirement.</p> |
申请公布号 |
EP0145346(A2) |
申请公布日期 |
1985.06.19 |
申请号 |
EP19840307992 |
申请日期 |
1984.11.19 |
申请人 |
GENERAL INSTRUMENT CORPORATION |
发明人 |
GARBIS, DENNIS;GRANATA, AMEDEO JAMES;CHAN, JOSEPH Y.;HELLER, ROBERT C. |
分类号 |
C23C16/00;C23C16/44;C23C16/458;H01L21/205;(IPC1-7):C23C16/44 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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