发明名称 Glow-discharge decomposition apparatus.
摘要 <p>A glow-discharge decomposition apparatus comprising ground electrodes, substrates, RF-electrodes, a RF-power supply, a matching circuit and a controlling circuit having at least one electric element; each of the substrates being provided on the ground electrodes which are placed over each of the RF-electrories in parallel to each other; each of the RF-electrodes standing in parallel and being electrically insulated to each other; the matching circuit being connected to accept a RF-power from the RF-power supply; the controlling circuit being connected to accept a RF-power from the matching circuit; and the outputs of the controlling circuit being connected to supply RF-powers to- the RF-electrodes. The films are fabricated on the substrates by supplying RF-powers being independently controlled via the controlling circuit, thereby plasmas are controlled over each of the RF-electrodes. Thus, deposition rates are individually controlled and uniform films are fabricated on each of the substrates.</p>
申请公布号 EP0165618(A2) 申请公布日期 1985.12.27
申请号 EP19850107698 申请日期 1985.06.21
申请人 KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA 发明人 TAWADA, YOSHIHISA;NAKAYAMA, TAKEHISA;TAI, MASAHIKO;IKUCHI, NOZOMU
分类号 H01L21/20;B09C1/02;C23C16/509;H01J37/32;(IPC1-7):C23C16/50 主分类号 H01L21/20
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