发明名称 PHOTOELECTRON MASK AND PHOTO CATHODE IMAGE PROJECTION METHOD USING THE SAME
摘要 A photoelectron mask for photo cathode image projection includes a transparent substrate (11), a pattern (12) formed on a main surface of the transparent substrate. The pattern includes a non-transparent material. The mask also includes a photoelectron emission film (13) formed so as to cover the main surface of the transparent substrate on which the pattern are formed. The photoelectron emission film includes a material selected from the group consisting of pure platinum, a platinum-rich material containing platinum as the major component, and a platinum compound.
申请公布号 EP0321147(A3) 申请公布日期 1990.03.14
申请号 EP19880311624 申请日期 1988.12.08
申请人 FUJITSU LIMITED 发明人 SAKAMOTO, KIICHI;YASUDA, HIROSHI;YAMADA, AKIO;KUDOU, JINKO
分类号 G03F1/00;G03F7/20;H01J1/34;H01J37/317;H01L21/027 主分类号 G03F1/00
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