发明名称 |
PHOTOELECTRON MASK AND PHOTO CATHODE IMAGE PROJECTION METHOD USING THE SAME |
摘要 |
A photoelectron mask for photo cathode image projection includes a transparent substrate (11), a pattern (12) formed on a main surface of the transparent substrate. The pattern includes a non-transparent material. The mask also includes a photoelectron emission film (13) formed so as to cover the main surface of the transparent substrate on which the pattern are formed. The photoelectron emission film includes a material selected from the group consisting of pure platinum, a platinum-rich material containing platinum as the major component, and a platinum compound. |
申请公布号 |
EP0321147(A3) |
申请公布日期 |
1990.03.14 |
申请号 |
EP19880311624 |
申请日期 |
1988.12.08 |
申请人 |
FUJITSU LIMITED |
发明人 |
SAKAMOTO, KIICHI;YASUDA, HIROSHI;YAMADA, AKIO;KUDOU, JINKO |
分类号 |
G03F1/00;G03F7/20;H01J1/34;H01J37/317;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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