发明名称 |
METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC SYSTEM |
摘要 |
Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process. The method comprising the steps of: obtaining first measurements comprising measurements of structural asymmetry relating to a plurality of first structures, each of said plurality of measurements of structural asymmetry corresponding to a different measurement combination of measurement radiation and a value for at least a first parameter; obtaining a plurality of second measurements of target asymmetry relating to a plurality of targets, each of said plurality of measurements of target asymmetry corresponding to one of said different measurement combinations, determining a relationship function describing the relationship between said first measurements and said second measurements, for each of said measurement combinations; determining, from said relationship function, a corrected overlay value, said corrected overlay value being corrected for structural contribution due to structural asymmetry in at least said first structure. |
申请公布号 |
WO2016169901(A1) |
申请公布日期 |
2016.10.27 |
申请号 |
WO2016EP58582 |
申请日期 |
2016.04.18 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
ZENG, Si-Han;PENG, Yue-Lin;FANG, Jen-Yu;DEN BOEF, Arie, Jeffrey;STRAAIJER, Alexander;HUNG, Ching-Yi;WARNAAR, Patrick |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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