Integrated circuit structure processing apparatus with chemically corrosion-resistant Al2O3 protective coating on surface of quartz window exposed to corrosive chemicals.

摘要

An improved integrated circuit processing apparatus is disclosed wherein a protective coating (40) of Al2O3 on the inner surface of a quartz (SiO2) window (10) in the wall (24) of the integrated circuit processing apparatus provides an enhanced resistance to the corrosive effects of fluorine-containing reagents on the protected inner surface of the quartz window (10). Formation of an Al2O3 coating having a minimum thickness of about 4 mu m, preferably about 6 mu m, and most preferably about 8 mu m, up to a maximum thickness of about 15 mu m, preferably about 12 mu m, with a coating uniformity of +/- 15% of the average coating thickness provides the desired protection of the inner surface of the quartz window (10) from corrosive attack by fluorine-containing reagents such as NF3, SF6, and fluorine-containing hydrocarbons, e. g. C2F6. <IMAGE>