发明名称 REMOVAL OF CARBON-BASED POLYMER RESIDUE BY USING OZONE USEFUL FOR CLEANING OF PLASMA REACTION CONTAINER
摘要 PURPOSE: To enable cleaning as planar plasma reaction vessel by exciting the atmosphere containing ozone in a reaction chamber, making reaction with carbon-based residue, and discharging the formed volatile final product from the reaction vessel. CONSTITUTION: Process gas which accompanies a cleaning cycle is made to flow into a reaction vessel 10 through an anode 16. A high-frequency voltage 25 is applied to the vessel, and ozone-containing reactive species are excited. Ozone plasma reacts with a fluorocarbon polymer 30 on the vessel surfaces 11, 12, 13, 16, 17, and forms a volatile residue. The reactive gas and the volatile residue are discharged from the reaction vessel, through a mechanical pump 29. The time for cleaning is 15-30 minutes. Thereby dry cleaning work is improved.
申请公布号 JPH0653193(A) 申请公布日期 1994.02.25
申请号 JP19930167347 申请日期 1993.06.15
申请人 MICRON TECHNOL INC 发明人 GAI TEII BURAROTSUKU
分类号 H01L21/205;B08B7/00;C23G5/00;H01L21/00;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):H01L21/302 主分类号 H01L21/205
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