| 摘要 |
PURPOSE:To provide a method of developing photoresist applied to a substrate, which includes means for minimizing the damage to photoresist due to developer. CONSTITUTION:A method of developing photoresist comprises the steps of applying a photoresist film 3 to a substrate 1, exposing it to light, dripping conductive liquid 4 on the photoresist film, and applying a developer 5 to develop the photoresist film covered with the conductive liquid. The conductive liquid and developer may be dripped simultaneously. |
