| 摘要 |
A projection type exposure apparatus comprises: a light source for radiating illumination light for exposure; an illumination optical system for irradiating with the illumination light a mask having a first pattern and a second pattern extending perpendicular to each other; the illumination optical system having a fly eye type integrator for forming a plurality of images of the light source on or near a Fourier transform plane to a pattern surface of the mask; a projection optical system for projecting an image of the patterns of the mask on a photosensitive substrate; and a stop member for restricting passage of the illumination light through the Fourier transform plane to an annular zone with center on an optical axis of the illumination optical system and for partially shielding or reducing the plurality of images of the light source such that a number of images of the light source contributing to a resolution of the first pattern is substantially identical with that of images of the light source contributing to a resolution of the second pattern in the annular zone.
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