| 摘要 |
PURPOSE:To improve developability, adhesive property, heat resistance and dry etching resistance and to enable the resolution of an excellent rectangular pattern shape by incorporating a polymer having specified org. groups and a radiation sensitive acid forming agent. CONSTITUTION:A polymer having org. groups represented by the formula and a radiation sensitive acid forming agent are incorporated. In the formula, (l) is 0 or 1, (n) is an integer of 1-3, each of R1 and R2 is H, a 1-4C alkyl, 1-4C alkoxy, 7-10C aralkyl or 6-10C aryl and each of R3-R5 is H, a 1-4C alkyl, 1-4C alkoxy, nitro, cyano, amino or halogen. The org. groups represented by the formula in the polymer are preferably contained as the side chain of the polymer. |
