| 摘要 |
PURPOSE:To obtain a photosensitive lithographic plate capable of reducing a developer replenishing amount and an industrial waste and superior in production suitability by a method wherein a photosensitive layer is provided on one surface of an aluminum substrate provided with anodized films on both surfaces thereof, and a specific coating layer is provided on the other surface of the aluminum substrate. CONSTITUTION:A photosensitive lithographic plate is formed by providing a photosensitive layer on one surface of an aluminum substrate provided with anodized films on both surfaces thereof and providing a coating layer on the other surface of the aluminum substrate. A metallic oxide obtained by hydrolyzing and polycondensing an organic or inorganic metallic compound and a colloidal silica sol are incorporated in the coating layer. An organic high-molecular compound, a plasticizer, and a fluorine- containing surfactant may be also incorporated in the coating layer. In the production of the lithographic plate, an image is formed on the photosensitive lithographic plate by exposure to light and developed by an alkali water solution of pH 12 5 or more containing an alkali metal silicate. In this manner a developer replenishing amount is reduced, and an industrial waste is reduced. |
