发明名称 |
PROCESS FOR PRODUCING PATTERN |
摘要 |
The method improves throughput and reduces butting error by controlling overlap distance in the range of width of the unit pattern size. The method comprises (A) defining a field (11) on the substrate; (B) partitioning patterns as small rectangular unit pattern and exposing the small unit pattern overlappingly; (C) radiating electron beams into the field in sequence and forming the whole pattern in field.
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申请公布号 |
KR940011203(B1) |
申请公布日期 |
1994.11.26 |
申请号 |
KR19920000807 |
申请日期 |
1992.01.21 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JO, KYONG - YON;KIM, HAK |
分类号 |
G03F7/00;G03F7/26;(IPC1-7):G03F7/26 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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