MAGNETRON SPUTTERING APPARATUS AND THIN FILM DEPOSITING METHOD,申请号KR19910003103-传众专利搜索

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发明名称	MAGNETRON SPUTTERING APPARATUS AND THIN FILM DEPOSITING METHOD
摘要
申请公布号	KR950000011(B1)	申请公布日期	1995.01.07
申请号	KR19910003103	申请日期	1991.02.26
申请人	NICHIDEN ANERUBA K. K.	发明人	YOSHIDA, HIDEAKI;AKA, YASUHIKO;KAWACHI, HARUYUKI;TAKAHASHI, NOBUYUKI
分类号	H01J37/34;(IPC1-7):C23C14/35	主分类号	H01J37/34
代理机构		代理人
主权项
地址

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