| 摘要 |
The method and apparatus of the invention permit in situ determinations to be made of the temperature and optical constants of a substrate surface (20) that is being treated, by measurements of radiance (I, E), reflectance (R) and transmittance (T). These determinations in turn provide, at any given instant during processing, compositional processing conditions. The apparatus comprises an integrated, small and relatively inexpensive instrument (10) for process monitoring. |
