| 摘要 |
PURPOSE: To enable a vacuum processing device to be freely changed in number of vacuum processing chambers corresponding to a change in process or a production line by a method wherein a buffer chamber is equipped with a second opening which is separate from a first opening and provided on another side wall, and a substrate is transferred between a transfer means and the outside of the buffer chamber through the second opening. CONSTITUTION: A vacuum processing device is equipped with a buffer chamber which can be exhausted and houses a vacuum chamber 20, vacuum open-close means 41 and 42 such as a gate valve, a partitioner or the like are provided on the side wall of the buffer chamber 10 corresponding to both the ends of a first substrate transfer means which is provided inside the buffer chamber 10 and capable of transferring a substrate 30 in the directions of arrows A. In this case, a pre-vacuum chamber 60 is provided in the buffer chamber 10 through the intermediary of vacuum open-close means 50 and 51 such as gate valves or the like provided on the other side wall which is vertical to the side wall where the vacuum open-close means 41 and 42 are provided and confronts the vacuum processing chamber 20 interposing the first substrate transfer means. A second substrate transfer means transfers substrates 30 in the directions of arrows B and C through the vacuum open-close means 50 and 51 together with the first substrate transfer means. |
