发明名称 LOW-IRRITANCY COMPOSITION CONTAINING ANIONIC SURFACTANTS
摘要 Low-irritancy compositions including at least one anionic surfactant and at least one derivative containing a tertiary nitrogen and one or more fragments consisting of polyoxy alkylene glycol and having general formula (I): R<1>-Z-N(R<2>)-[(CH2)x-N(W)]n-W, wherein R<1> is a hydrocarbon radical, Z is a group containing at least one sp3-type carbon atom bound to two hydrogen atoms, or at least one sp2-type carbon atom bound to at least one heteroatom from groups V or VI of the periodic table, W is the radical -[(CH2-CH(R<3>)-O)]m-1-CH2-CH(R<3>)-OH, or R<2> is a hydrogen atom, a C1-4 hydrocarbon radical, or W, x is from 2 to 6 and n is from 0 to 12. The use of a derivative having a tertiary nitrogen in compositions that include at least one anionic surfactant in order to reduce the irritancy of the composition, as well as the use of such compositions, e.g., in cosmetics and detergency, are also disclosed.
申请公布号 WO9700310(A1) 申请公布日期 1997.01.03
申请号 WO1996FR00910 申请日期 1996.06.14
申请人 RHONE-POULENC CHIMIE;DERIAN, PAUL-JOEL;RICCA, JEAN-MARC 发明人 DERIAN, PAUL-JOEL;RICCA, JEAN-MARC
分类号 A01N25/30;A61K8/45;A61Q5/02;A61Q19/10;C11D1/02;C11D1/10;C11D1/12;C11D1/14;C11D1/28;C11D1/29;C11D1/34;C11D1/52;C11D1/65;(IPC1-7):C11D1/65;A61K7/50 主分类号 A01N25/30
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