发明名称 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTION OF RESIST IMAGE
摘要 PROBLEM TO BE SOLVED: To obtain excellent storage stability. SOLUTION: This negative photosensitive resin compsn. contains an alkali- soluble resin, acid-producing agent, amino resin and a solvent and has <=0.15wt.% water content. This negative photosensitive resin compsn. is applied on a substrate, dried, exposed to light or irradiated with active radiation, heated and then developed with an alkali soln.
申请公布号 JPH09146275(A) 申请公布日期 1997.06.06
申请号 JP19950301161 申请日期 1995.11.20
申请人 HITACHI CHEM CO LTD 发明人 KASUYA KEI;SASAKI MAMORU;KATO KOJI;NAKANO HAJIME;KOIBUCHI SHIGERU;HASHIMOTO MICHIAKI
分类号 G03F7/004;G03F7/029;G03F7/038;G03F7/38;H01L21/027;(IPC1-7):G03F7/038 主分类号 G03F7/004
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