| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resist compsn. having high sensitivity, ensuring fine profile, superior preservability and heat resistance of a resist and sensitive to far UV, etc., by using an alkali-soluble resin, a dissolution inhibitor obtd. by substituting a specified acid-decomposable compd. at the hydrogen positions of hydroxyl groups of a specified arom. polyhydroxy compd. and a specified onium salt as an optical acid generating agent. SOLUTION: This compsn. consists of an alkali-soluble resin, a dissolution inhibitor obtd. by substituting an acid-decomposable compd. represented by formula II-1, II-2, etc., at the hydrogen positions of hydroxyl groups of an arom. polyhydroxy compd. represented by formula I and an onium salt represented by the formula Ar3 X<+> Y<-> (III) as an optical acid generating agent. In the formula I, each of R1 and R2 is H, halogen, alkyl, etc., (a) is 1-3, (b) is 1-8, (c) is 1-12 and R<3> is aliphatic hydrocarbon, ether, etc. In the formula III, Ar is arom. hydrocarbon, etc., X is halogen, S, etc., and Y is BF4 , PF6 , etc. |
